| 貨號 | 產(chǎn)品名稱 | 規(guī)格 |
| 3200 | Sputtering head insert suitable for oxidizing and non-oxidizing metals. Supplied with a 54mm x 0.3mm thick chromium target as standard. For additional targets see Sputtering Targets section | 個 |
| 3210 | Additional sputter insert for quick metal change. Note: this is an entire sputtering assembly. | 個 |
| 3270 | Extended height vacuum chamber （214mm high – the standard chamber is 127mm high）. For increased source to sample distance and for coating large specimens | 個 |
| 3280 | Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the EMS150T when bench depth is limited | 個 |
| 3290 | Film thickness monitor （FTM） attachment. Consists of a built in chamber mounted quartz crystal oscillator （includes crystal）. As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This ‘modification’ is used to measure and control the thickness of material deposited | 個 |
| 3300 | Spare quartz crystals. Pack of three | 個 |
| 3320 | Full range vacuum gauge for low and high vacuum measurement （a low vacuum Pirani gauge is fitted as standard） | 個 |
| 4513 | Glow discharge insert to modify surface properties （eg hydrophobic to hydrophilic conversion） or to clean surface residues （TS and T ES only）. Can be retrofitted | 個 |
| 3340 | Rotate-tilt specimen stage with adjustable tilt （up to 90 degrees） and height （37mm-60mm）. Tilt angle can be pre-set. 50mm Ø specimen platform with six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm | 個 |
| 3350 | Variable angle “Rotacota” rotary planetary stage with 50mm Ø specimen platform. Has six stub positions for 15mm or 6.5mm or 1/8" pin stubs. Stage rotation speed variable between 8 and 20rpm | 個 |
| 3360 | Flat rotation specimen stage for 100mm / 4” wafers, includes gearbox for increased coverage. Stage rotation speed variable between 8 and 20rpm | 個 |
| 3370 | variable between 8 and 20rpm. Includes gear box to allow optional FTM to be used | 個 |
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